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Dielectric breakdown by constant current injection

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1 Author(s)
Wang, S.F. ; Microelectron. Centre, Acad. Sinica, Beijing, China

Dielectric breakdown of SiO2 film is investigated with the constant injection current technique to determine whether a current density or an injected charge density is the critical parameter for breakdown

Published in:

Microelectronics and VLSI, 1995. TENCON '95., IEEE Region 10 International Conference on

Date of Conference:

6-10 Nov 1995