By Topic

Electron‐beam lithography of curved structures with an enhanced vector‐scan pattern generator supporting conic‐based primitives

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Vasey, F. ; IBM Research Division, Zurich Research Laboratory, CH‐8803 Rüschlikon, Switzerland ; Prongue, D. ; Rothuizen, H. ; Vettiger, P.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

An IBM vector‐scan machine is adapted to the generation of curved patterns by adding a new primitive to its basic set. Quadratic polynomials characterize the curved boundaries of this new primitive, allowing the construction of any conic section in the beam‐stepping plane. The implementation is based on a digital signal processor running in tandem with the existing microcontroller and maintains full compatibility with existing hardware and software. The conic sections are approached to the best possible accuracy (better than 1/2 beam step), and the dose is uniformly distributed throughout the area of the primitive as the exposed points remain on a cartesian grid. The successful exposure of an elliptical diffractive optical element with chirped periodicity demonstrates the functionality of the upgraded machine.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:12 ,  Issue: 6 )