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Electron‐beam lithography of curved structures with an enhanced vector‐scan pattern generator supporting conic‐based primitives

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4 Author(s)
Vasey, F. ; IBM Research Division, Zurich Research Laboratory, CH‐8803 Rüschlikon, Switzerland ; Prongue, D. ; Rothuizen, H. ; Vettiger, P.

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An IBM vector‐scan machine is adapted to the generation of curved patterns by adding a new primitive to its basic set. Quadratic polynomials characterize the curved boundaries of this new primitive, allowing the construction of any conic section in the beam‐stepping plane. The implementation is based on a digital signal processor running in tandem with the existing microcontroller and maintains full compatibility with existing hardware and software. The conic sections are approached to the best possible accuracy (better than 1/2 beam step), and the dose is uniformly distributed throughout the area of the primitive as the exposed points remain on a cartesian grid. The successful exposure of an elliptical diffractive optical element with chirped periodicity demonstrates the functionality of the upgraded machine.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:12 ,  Issue: 6 )