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Use of a variable shaped beam electron lithography system for diffractive optics components manufacturing

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1 Author(s)
Trotel, Jacques ; Elisa—European Lithography Innovation SA, 18, avenue du Québec, B. P. 736, 91962 Les Ulis Cedex, France

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.586993 

Binary diffractive optical components using 1–3 mask levels are being manufactured with a variable shaped electron beam system with ‘‘write on the fly’’ writing mode, which is also used for conventional microelectronic applications. Two examples of components are described.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:11 ,  Issue: 6 )

Date of Publication:

Nov 1993

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