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Use of a variable shaped beam electron lithography system for diffractive optics components manufacturing

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1 Author(s)
Trotel, Jacques ; Elisa—European Lithography Innovation SA, 18, avenue du Québec, B. P. 736, 91962 Les Ulis Cedex, France

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Binary diffractive optical components using 1–3 mask levels are being manufactured with a variable shaped electron beam system with ‘‘write on the fly’’ writing mode, which is also used for conventional microelectronic applications. Two examples of components are described.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:11 ,  Issue: 6 )