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Influence of magnetic field on the self‐bias potential on a radio frequency‐powered electrode in radio frequency plasma

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6 Author(s)
Tsuzuki, K. ; Department of Applied Physics, University of Tokyo, Hongo 7‐3‐1, Bunkyo‐ku, 113 Tokyo, Japan ; Tabuchi, S. ; Banno, T. ; Kinbara, A.
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Electric self‐bias potential and its distribution on the radio frequency (rf) electrode in an rf plasma have been measured using probes buried in the electrode. The potential increases almost proportionally with the net rf power (Wrf) ranging from 5 to 80 W. When the magnetic field parallel to the electrode (Wrf=26 W) is applied, the potential is reduced from -150 V (0 T) to -50 V (0.04 T) at the center of the electrode and the gradient in the potential distribution occurs along the E×B direction. This mechanism, the role of the external magnetic field, and the industrial applicability are discussed.

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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:11 ,  Issue: 3 )