Cart (Loading....) | Create Account
Close category search window
 

High‐speed, low‐overhead electron beam direct slice writing system

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Varnell, G.L. ; Texas Instruments, Incorporated, P.O. Box 5012, Dallas, Texas 75222 ; Spicer, D.F. ; Hebley, J. ; Robbins, R.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.570295 

Electron beam writing systems have been primarily used for photomask and reticle fabrication because of the limited throughput ahievable. A vector‐scan beam writing system (EBSP) has been developed with a 1–1.25 μm resolution capability and ±0.25 μm pattern overlay accuracy and a potential throughput capability of 14 3‐in. slices/h for 1–1.25 μm minimum pattern geometries and 20 3‐in. slices/h for 2.5 μm minimum pattern geometries. This paper discusses the throughput factors for vector‐scan e‐beam systems and describes the new developments and improvements to tne major subsystems of the earlier photomask machine (EBM II) which were necessary to achieve this order of magnitude improvement in throughput.

Published in:

Journal of Vacuum Science and Technology  (Volume:16 ,  Issue: 6 )

Date of Publication:

Nov 1979

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.