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Effect of annealing on magnetotransport and structural properties of Co/Cu multilayers with Ta buffer layer

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3 Author(s)
Mohanan, Senthilnathan ; Materials Division, University of Ulm, Ulm 89077, Germany ; Grob, Andreas ; Herr, U.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2165928 

The main aim of this study is to investigate the effect of annealing on magnetotransport and on structural properties of Co/Cu multilayer with Ta buffer layer, prepared by dc magnetron sputtering. The heat treatment of the sample at 250 °C up to 20 h induced a prominent change in giant magnetoresistance, which correlates with the corresponding changes in remanent magnetization. In order to investigate the origin of the changes in the magnetotransport properties, the microstructure of the samples has been studied by x-ray diffraction. The structural modifications were elucidated by comparing x-ray spectra calculated using a nonideal step model with measured spectra and they are related to the changes in magnetotransport properties. A correlation between the changes in remanence and interlayer exchange coupling has been established using a modified Stoner-Wohlfarth [Philos. Trans. R. Soc. London, Ser. A 240, 599 (1948)] model.

Published in:

Journal of Applied Physics  (Volume:99 ,  Issue: 8 )

Date of Publication:

Apr 2006

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