Close category search window
 

Comparison between the in-plane anisotropies and magnetostriction constants of thin epitaxial Fe films grown on GaAs and Ga0.8In0.2As substrates, with Cr overlayers

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Morley, N.A. ; Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom ; Gibbs, M.R.J. ; Ahmad, E. ; Will, I.G.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2158974 

Thin epitaxial Fe films grown on GaAs(100) and Ga0.8In0.2As(100) substrates were investigated to determine how tuning the lattice constant mismatch between the Fe and the substrate may change the in-plane anisotropies and the magnetostriction. Two sets of Fe films were grown using molecular-beam epitaxy, each capped with a Cr overlayer. For each film, the in-plane anisotropy constants were determined from the normalized magnetization loops measured using a magneto-optic Kerr effect magnetometer. The lattice mismatch was found to give no contribution to the in-plane anisotropies. For all the films the magnetostriction constants, determined by the Villari method, were negative and became more negative as the Fe thickness decreased.

Published in:
Journal of Applied Physics  (Volume:99 ,  Issue: 8 )

Date of Publication: Apr 2006

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.