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Diffusion in interstitial compounds with thermal and stoichiometric defects

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3 Author(s)
Hillert, Mats ; Department of Materials Science and Engineering, Royal Institute of Technology (KTH), SE-10044 Stockholm, Sweden ; Hoglund, Lars ; Agren, John

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The ordinary flux equation for diffusion, which considers the composition gradient as the driving force, is seldom of much use in studying closely stoichiometric phases. Depending on the defect structure it would instead be profitable to use an appropriate function of the activity. Such functions will now be derived and it will be shown how the operating defect mechanism of diffusion can be identified from information on the variation of the activity inside a phase during diffusion. However, it is usually very difficult to measure the activity profile inside a phase. It will be shown how it can be obtained by combining results from several experiments. The method will be used to analyze experimental information on the formation of surface layers of Fe4N and Fe3C.

Published in:

Journal of Applied Physics  (Volume:98 ,  Issue: 5 )