By Topic

Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Worsley, M.A. ; Department of Chemical Engineering, Stanford University, Stanford, California 94305 ; Bent, S.F. ; Fuller, N.C.M. ; Dalton, T.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Reactive neutral species densities for various conditions in dual frequency capacitively coupled discharges of Ar/O2, Ar/N2, and Ar/H2 were determined using optical emission spectroscopy, Kr actinometry, and modeling. The reactive neutral species probed in this work include O, O2, N, N2, H, and H2. Densities are reported as a function of pressure (5–60 mTorr), percent Ar in the feed gas (1%–86%), source power (50–800 W), and bias power (0 W, 200 W). It was found that increasing the pressure from 5 to 60 mTorr resulted in order of magnitude increases in atomic species densities for all ash chemistries. At 30 mTorr, percent dissociation is relatively low (≤15%) for all species. Also, at 30 mTorr, the addition of Ar resulted in a small decrease in N and H densities, but an order of magnitude increase in O density. Based on modeling, it is proposed that the increase in O density is due to an increasing contribution of Penning dissociation with increasing Ar density. Only the source power contributed significantly to O and N radical densities, but 200 W bias power generated a significant H radical density above that generated via the source power. Details of these results are discussed in comparison with theory and literature.

Published in:

Journal of Applied Physics  (Volume:100 ,  Issue: 8 )