Cart (Loading....) | Create Account
Close category search window

Vibrational and rotational excitation in a capacitively coupled 13.56 MHz radio frequency CF4 plasma studied by infrared absorption spectroscopy

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Haverlag, M. ; Eindhoven University of Technology, Department of Physics, P.O. Box 513, 5600 MB Eindhoven, The Netherlands ; de Hoog, F.J. ; Kroesen, G.M.W.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Infrared absorption spectroscopy has been used to determine the vibrational and rotational excitation of CF4 in a parallel plate plasma etcher. The vibrational and rotational temperatures Tvib and Trot of the CF4 molecules were extracted from the band structure of the ν3 peak of CF4 around 1283 cm-1, using a double beam Fourier transform spectrometer. Measurements were performed with and without plasma, at 0.12 cm-1 apodized resolution. From the change of the relative (hot) Q‐branch intensities the vibrational temperature was estimated. Furthermore the rotational temperature, which is in these conditions likely to be very close to the gas temperature, was estimated from the shape and intensity of the R branch of the ν3 peak. It was established that both Tvib and Trot have values around 400 and 350 K, respectively. It is therefore concluded that under the studied circumstances the influence of the plasma on Tvib is small.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:9 ,  Issue: 2 )

Date of Publication:

Mar 1991

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.