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Effect of noble gases on the properties of ion beam sputtered niobium films

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3 Author(s)
Lichtenwalner, D.J. ; Massachusetts Institute of Technology–Lincoln Laboratory, Lexington, Massachusetts 02173 and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 ; Anderson, A.C. ; Rudman, D.A.

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We present result to support our hypothesis that the reflection of the primary beam during ion-beam sputtering of niobium films plays a significant role in determining final film properties, especially in the case of ion-beam sputtering. The film properties are afected by both the noble gas incorporation in and noble-gas bombardment of the growing film. (AIP)

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:7 ,  Issue: 1 )

Date of Publication:

Jan 1989

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