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Studies of interfacial composition of TiN films formed by plasma‐assisted chemical vapor deposition using an in situ scratching device

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5 Author(s)
Hilton, M.R. ; Center for Advanced Materials, Lawrence Berkeley Laboratory, and Department of Materials Science and Mining Engineering and Department of Chemistry, University of California at Berkeley, Berkeley, California 94720 ; Middlebrook, A.M. ; Rodrigues, G. ; Salmeron, M.
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The interfacial composition of plasma‐assisted chemical vapor deposited TiN films on M2 tool steel is reported. An in situ scratcher with a scratch adhesion test type diamond stylus was used to create scratches in ultrahigh vacuum (UHV). Auger electron spectroscopy analysis of the adhesive mode failures revealed a sharp chlorine concentration gradient at the exposed surface representing the prior interface. The scratch removal technique data is compared to sputter depth profile data. Scanning electron microscopy and energy dispersive spectroscopy investigation of the scratches following the UHV work is also presented and discussed.

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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:4 ,  Issue: 6 )