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New method of tubular material inner surface modification by plasma source ion implantation

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3 Author(s)
Sun, Mu ; Group 101, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People’s Republic of China ; Yang, Si-Ze ; Li, Bing

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.579902 

Plasma source ion implantation is a non‐line‐of‐sight ion implantation technique for surface modification of materials, but that technique is only suitable for outer surface modification of hollow targets, not for inner surface modification. In this article we present a new method that applies to inner surface implantation. Preliminary experimental results show that this new method increases plasma density and uniformity inside the tubular target with the inner surface, generates a plasma sheath between the inner surface of the target and the plasma to implant the inner surface of the target effectively, and achieves a dose uniformity that is acceptable for industrial applications. © 1996 American Vacuum Society

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:14 ,  Issue: 2 )

Date of Publication:

Mar 1996

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