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Spectroscopic ellipsometry of thin films on transparent substrates: A formalism for data interpretation

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2 Author(s)
Yang, Y.H. ; Coordinated Science Laboratory and Department of Materials Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801 ; Abelson, J.R.

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By reviewing the operational principles of modern rotating analyzer ellipsometry, we propose general analytical formalism which permits the analysis of spectroscopic ellipsometry data for thin films on transparent substrates. The inclusion of incoherent reflection from the backsurface of an optically thick substrate changes the usual definitions of Δ and ψ. Experimental data on both glass and ZnO‐coated glass are modeled to confirm the validity of this new formalism. We also simulated the ellipsometry spectra of amorphous silicon on glass to show the potential for in situ studies. The results show that the accuracy of ellipsometry data can be improved by including this incoherent backsurface reflection in the measurement, as opposed to roughening the back of the substrate. © 1995 American Vacuum Society  

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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:13 ,  Issue: 3 )