Cart (Loading....) | Create Account
Close category search window
 

Amorphous nitrogenated carbon films: Structural modifications induced by thermal annealing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Freire, F.L. ; Departamento de Física, Pontifícia Universidade Católica do Rio de Janeiro, 22452‐970, Rio de Janeiro, RJ, Brazil ; Achete, C.A. ; Mariotto, G. ; Canteri, R.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.578934 

Hard amorphous nitrogenated carbon films [a‐C:H(N)] deposited by self‐bias glow discharge were annealed in vacuum in the temperature range of 300–800 °C. The annealing time was 30 min. The structural and compositional modifications induced by thermal annealing were followed by several analytical techniques: secondary ion mass spectrometry (SIMS), Raman spectroscopy, Rutherford backscattering spectrometry, elastic recoil detection (ERDA), and nuclear reaction analysis. The internal stress of the films was also measured. Nuclear analyses indicate that both nitrogen and hydrogen losses occur for annealing temperatures higher than 300 °C. ERDA and SIMS results suggest that hydrogen and nitrogen out‐diffusion occurs by molecular transport through an interconnect network of voids. In the same temperature range, Raman scattering reveals an increase of the number and/or the size of the graphite domains. Internal stress is compressive for the as‐deposited films and changes to tensile for samples annealed at 800 °C, indicating the progressive graphitization of films. A comparison with amorphous carbon films (a‐C:H) is also made.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:12 ,  Issue: 6 )

Date of Publication:

Nov 1994

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.