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Fabrication of nanometer‐scale structures using atomic force microscope with conducting probe

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4 Author(s)
Hattori, T. ; Department of Electrical and Electronic Engineering, Musashi Institute of Technology, 1‐28‐1 Tamazutsumi, Setagaya‐ku, Tokyo 158, Japan ; Ejiri, Yasunori ; Saito, Kenji ; Yasutake, Masatoshi

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Nanometer‐scale structures were fabricated using electric field enhanced oxidation using an atomic force microscope with a conducting probe. The dependencies of thicknesses and widths of oxide stripes on applied voltage and time during which voltage is applied, were investigated. Also, the dependencies of depths of trenches, which are fabricated on the silicon surface by removing oxide stripes, on applied voltage and time during which voltage is applied, were investigated. The oxidation mechanism is discussed based on these investigations.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:12 ,  Issue: 4 )

Date of Publication:

Jul 1994

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