Referenced Items are not available for this document.
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.578140
Pattern transfer onto semiconducting carbon films with diamondlike properties using optical lithography and radio frequency oxygen plasma etching is reported. Titanium, aluminium, and gold were used as masking materials during oxygen etching. It was found that the titanium mask was most suitable for this process because of better resistance to the oxygen plasma. The microstructures observed were very uniform and well defined.
Published in:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
(Volume:10
,
Issue:
1
)
Date of Publication: Jan 1992
- Page(s):
- 225 - 228
- ISSN :
- 0734-2101
- Digital Object Identifier :
- 10.1116/1.578140
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- Jan 1992
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
