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Pattern transfer onto semiconducting carbon films with diamondlike properties using optical lithography and radio frequency oxygen plasma etching is reported. Titanium, aluminium, and gold were used as masking materials during oxygen etching. It was found that the titanium mask was most suitable for this process because of better resistance to the oxygen plasma. The microstructures observed were very uniform and well defined.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (Volume:10 , Issue: 1 )
Date of Publication: Jan 1992