By Topic

Control of photoresist properties: a Kalman filter based approach

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Palmer, E. ; California Univ., Berkeley, CA ; Spanos, C.J.

The photolithography step in the semiconductor manufacturing process becomes increasingly critical as linewidths decrease for the next generation of integrated electronics. It therefore becomes necessary to reduce variations in photoresist parameters such as resist film thickness and photoactive compound concentration during manufacture. In this paper, we present a simple feedback scheme for accurately regulating these parameters. Our approach involves obtaining a simple, static process model the coefficients of which are recursively adjusted based on previous wafer measurements. We use this adaptive model to determine appropriate input setpoints for the next wafer. The effectiveness of this scheme in reducing process drift is exhibited by experimental data. Our results supports the widespread contention that modern feedback control offers the promise of improving the semiconductor manufacturing processes, often with relative ease and minimal capital cost

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:9 ,  Issue: 2 )