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Control of photoresist properties: a Kalman filter based approach

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3 Author(s)
Palmer, E. ; California Univ., Berkeley, CA ; Wei Pen ; Spanos, C.J.

The photolithography step in the semiconductor manufacturing process becomes increasingly critical as linewidths decrease for the next generation of integrated electronics. It therefore becomes necessary to reduce variations in photoresist parameters such as resist film thickness and photoactive compound concentration during manufacture. In this paper, we present a simple feedback scheme for accurately regulating these parameters. Our approach involves obtaining a simple, static process model the coefficients of which are recursively adjusted based on previous wafer measurements. We use this adaptive model to determine appropriate input setpoints for the next wafer. The effectiveness of this scheme in reducing process drift is exhibited by experimental data. Our results supports the widespread contention that modern feedback control offers the promise of improving the semiconductor manufacturing processes, often with relative ease and minimal capital cost

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Semiconductor Manufacturing, IEEE Transactions on  (Volume:9 ,  Issue: 2 )