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Study of annealed Co thin films deposited by ion beam sputtering

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4 Author(s)
Sharma, A. ; University Grant Commission, Department of Atomic Energy Consortium for Scientific Research, University Campus, Khandwa Road, Indore-452 017, India ; Brajpuriya, R. ; Tripathi, S. ; Chaudhari, S.M.

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This paper presents structural, magnetic and transport property measurements carried out on as deposited as well as annealed Co (400 Å) thin films. The magnetization measurements carried out using a magneto-optical Kerr effect (MOKE) technique show large increases in coercivity and saturation field values with annealing of the samples at higher temperatures. However, corresponding resistivity measurements show a gradual decrease in resistivity and drops to minimum at 500 °C. Observed magnetization and resistivity behavior is mainly attributed to (i) change in crystal structure from hcp to fcc; (ii) increase in grain size; and (iii) stress relaxation due to the annealing treatment as revealed by x-ray diffraction measurements.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:24 ,  Issue: 1 )

Date of Publication:

Jan 2006

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