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Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics

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5 Author(s)
Klebanoff, L.E. ; Sandia National Laboratories, P.O. Box 969, MS 9409, Livermore, California 94551-0969 ; Malinowski, M.E. ; Clift, W.M. ; Steinhaus, C.
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A technique is described that uses a gas-phase species to mitigate the oxidation of a Mo/Si multilayer optic caused by either extreme UV (EUV) or electron-induced dissociation of adsorbed water vapor. It is found that introduction of ethanol (EtOH) into a water-rich gas-phase environment inhibits oxidation of the outermost Si layer of the Mo/Si EUV reflective coating. Auger electron spectroscopy, sputter Auger depth profiling, EUV reflectivity, and photocurrent measurements are presented that reveal the EUV/water- and electron/water-derived optic oxidation can be suppressed at the water partial pressures used in the tests (∼2×10-7–2×10-5Torr). The ethanol appears to function differently in two time regimes. At early times, ethanol decomposes on the optic surface, providing reactive carbon atoms that scavenge reactive oxygen atoms before they can oxidize the outermost Si layer. At later times, the reactive carbon atoms form a thin (∼5 Å), possibly self-limited, graphitic layer that inhibits water adsorption on the optic surface. © 2004 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:22 ,  Issue: 2 )