By Topic


Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Marrian, Christie R.K. ; IBM Almaden Research Center, San Jose, California 95120 ; Tennant, D.M.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

In this the 50th anniversary year of the AVS and the AVS Symposium, this article is offered as one in a series of topical review articles to celebrate the role of this community to the progress in nanofabrication technology. The emphasis of the article is on the principles and limits of the various pattern formation techniques which have emerged as important tools in the research of nanoscale devices and structures. Topics such as e-beam lithography, proximal probes, imprint lithography, self assembly, and directed assembly are all discussed. © 2003 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:21 ,  Issue: 5 )