Cart (Loading....) | Create Account
Close category search window
 

Observation of the phase formation in Fe–N films deposited by reactive pulsed laser deposition

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Wang, N. ; Microelectronics Research Center and Department of Materials Science and Engineering, Iowa State University, Ames, Iowa 50011 ; Ulmer, K.M. ; Constant, A.P. ; Anderegg, J.W.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1598972 

Fe–N films have been grown on SiO2/Si(100) substrates by reactive pulsed laser deposition (PLD). A series of films was deposited at 20 °C and at 250 °C, with a wide range of nitrogen pressures. Both nitrogen pressure and deposition temperature were found to affect the film average compositions, structures, phase percentages, and magnetic properties of the films. The saturation magnetization of the films is shown to depend not only on their average nitrogen content but also on the phases and their relative amounts that make up the films. In particular, the iron nitrides γ-Fe4N, and ε-Fe3N (which has a wide range of composition) play a major role in determining the magnetization. Results can be understood in terms of the relative contributions of the deposition rate and atomic surface diffusion in producing thin-film structure. To date, no giant moments larger than Ms of pure Fe have been observed in this investigation. © 2003 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:21 ,  Issue: 5 )

Date of Publication:

Sep 2003

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.