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Environment, health, and safety performance plays a vital role in sustaining the growth of the semiconductor industry

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2 Author(s)
Miller, Coleen ; International SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741 ; Worth, Walter

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1568742 

Rapid technology advances and rapid growth have historically been the basis for the success of the semiconductor industry. Over the last 25 years the industry has enjoyed a growth rate (∼15%) which far exceeds the growth rate of the U.S. economy overall (3%–4%). To ensure that this rapid growth rate can be sustained into the future, it is important that the industry makes efficient use of natural resources, minimizes any impact on the environment, and ensures the protection of its workers and the communities in which it operates. It has been repeatedly shown that resource efficiency is linked to lower operating costs and better environmental performance. International SEMATECH’s Environment, Safety and Health (ESH) division is engaged in several projects that are aimed at enabling continued, sustainable growth for the industry. These include energy and water conservation, perfluorocompound (PFC) emissions reduction as well as early ESH assessment of the multitude of new chemicals and materials being considered for 157 nm photolithography, low-k dielectrics, and advanced gate stacks. The timely assessment of any potential ESH impacts associated with these materials is essential to ensure that they are used in a safe and environmentally sound manner through cost-efficient ESH solutions and controls. This paper will describe the approach and results of International SEMATECH’s efforts in the areas of resource conservation, PFC emissions reduction, and early identification of potential ESH impacts associated with the next generation semiconductor chemicals and materials. © 2003 American Vacuum Society.

Published in:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:21 ,  Issue: 4 )

Date of Publication: Jul 2003

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