By Topic

Annealing behavior of a Cs2O/Cs2O2/GaAs(110) surface studied by electron spectroscopy

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Wu, J.X. ; Structure Research Laboratory, University of Science and Technology of China, Hefei 230026, Peoples’s Republic of China ; Li, F.Q. ; Zhu, J.S. ; Ji, M.R.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1494817 

A Cs2O/Cs2O2 overlayer was prepared by simultaneous oxygen–cesium adsorption on GaAs(110) at room temperature. In situ electron spectroscopy and work function measurements have been used to study the Cs2O/Cs2O2/GaAs surface as a function of annealing temperature. The Cs2O/Cs2O2/GaAs surface exhibits metallic and has a work function value of 0.9 eV. There are Cs–O–Ga, Cs–O–As, As–O, and Ga–O bonds at the interface of Cs2O2/GaAs. Annealing facilitates the interfacial reaction and the minimum of the work function (0.7 eV) was observed after annealing at 540 K. After the decomposition of Cs2O and Cs2O2 at 620 K, the surface dominated by the Cs–O–Ga and Cs–O–As species remains negative electron affinity with a work function value of 1.1 eV. For further annealing, the fast Cs desorption is associated with the decomposition of the Cs–O–Ga and Ca–O–As bonds as well as the evaporations of As2O3 and CsAsO2, forming Ga2O3. © 2002 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:20 ,  Issue: 5 )