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Near-surface generation of negative ions in low-pressure discharges

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5 Author(s)
Stoffels, E. ; Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands ; Stoffels, W.W. ; Kroutilina, V.M. ; Wagner, H.-E.
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Formation processes of negative ions in low-pressure plasmas are not yet fully understood: as a rule experiments reveal higher negative ion density than predicted by the models. In this work we report near-surface generation of negative ions. This hitherto neglected formation mechanism appears to be important in low-pressure discharges and can have large impacts on the bulk plasma chemistry. We monitor energy-resolved positive and negative ion fluxes arriving at the electrodes in an oxygen parallel-plate radio-frequency (rf, 13.56 MHz) and dc glow plasmas by means of a quadrupole mass spectrometer. Negative ions formed in the plasma volume are observed by extracting them through an orifice in the anode of a dc glow discharge. Unexpectedly, we record large negative ion signals at the cathode of a dc discharge and at the grounded electrode of an rf discharge. These ions are formed in the plasma sheath, in collision processes involving high-energy species. We propose an efficient mechanism of negative ion generation due to ion pair formation in the sheath. © 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:19 ,  Issue: 5 )

Date of Publication:

Sep 2001

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