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Cluster deposition study by molecular dynamics simulation: Al and Cu cluster

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6 Author(s)
Kang, Jeong Won ; Semiconductor Process and Devices Laboratory, Department of Electronic Engineering, Chung-Ang University, 221 HukSuk-Dong, DongJak-Ku, Seoul 156-756, Korea ; Choi, Ki Seok ; Kang, Jin Cheol ; Kang, Eu Seok
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1379318 

The ionized cluster beam deposition of Al and Cu clusters has been investigated with a classical molecular dynamics simulation and the Metropolis Monte–Carlo simulation. The spreading of the cluster has been studied as functions of cluster size and initial cluster energy. When the local area reached the local melting spot on the surface around the impact point of an energetic cluster, during a few ps, intermixing was easily achieved and a good epitaxial film with optimum bulk density was formed. For uniform film growth using a cluster impact, it is necessary to make the local area temperature higher than melting temperature on the surface around the impact point of an energetic cluster. © 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:19 ,  Issue: 4 )

Date of Publication:

Jul 2001

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