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Deposition of amorphous nitrogenated carbon films using an alternate plasma deposition method in a dual electron cyclotron resonance-radio frequency plasma

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2 Author(s)
Hong, Junegie ; Laboratoire des Plasmas et des Couches Minces, IMN-CNRS–Université de Nantes, 44322 Nantes Cedex 3, France ; Turban, Guy

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In this article, we present a new method for the synthesis of amorphous nitrogenated carbon films using an alternate CH4 plasma deposition/subsequent N2 plasma treatment, so-called alternate plasma deposition (APD), in a dual electron cyclotron resonance (ECR)-rf plasma. The nitrogen to carbon ratio in the film surface deposited by this method, estimated by x-ray photoelectron spectroscopy (XPS), is considerably higher, by about a factor of 2, than that obtained in the film deposited from a conventional CH4/N2 plasma. From infrared spectroscopy it is shown that the APD film has the more enhanced disordered phase, which is accompanied by an increase of the amount of sp2 hybridized carbon-nitrogen bonds, as shown by XPS spectra. © 1999 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:17 ,  Issue: 1 )

Date of Publication:

Jan 1999

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