By Topic

Study of chromium oxide film growth by chemical vapor deposition using infrared reflection absorption spectroscopy

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Bermudez, V.M. ; Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC 20375-5347 ; DeSisto, W.J.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1339008 

Polarization-modulated infrared reflection absorption spectroscopy (aided by numerical modeling) is demonstrated as a potentially useful tool for the study of the chemistry of materials growth and processing under steady-state conditions. This approach is applied to a preliminary investigation of the growth of Cr oxide films at low-temperature (≤270 °C) on Al2O3 using Cr(CO)6 and O2. The use of a buried metal layer and of polarization modulation enables detection of surface species with good sensitivity in the presence of strong absorption by gas-phase molecules. Cr(CO)6 weakly interacting with Al2O3 and Cr oxide surfaces has been observed under equilibrium conditions, and a desorption energy of ∼11 kcal/mol has been deduced from the temperature-dependent intensity of the v6(t1u) carbonyl stretching mode. The 735 cm-1 longitudinal optic mode of Cr2O3 is observed during steady-state growth and simulated using the multilayer Fresnel relations for polarized reflectance. The growth is found to be first order in the Cr(CO)6 pressure under the present conditions.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:19 ,  Issue: 2 )