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Erratum: “Effects of BCl3 addition on Ar/Cl2 gas in inductively coupled plasmas for lead zirconate titanate etching” [J. Vac. Sci. Technol. A 18, 1373 (2000)]

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5 Author(s)
An, Tae-Hyun ; Department of Electrical Engineering, Chungang University, 221, Huksuk-Dong, Dongjak-Gu, Seoul 156-756, Korea ; Park, Joon-Yong ; Yeom, Geun-Young ; Chang, Eui-Goo
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© 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:18 ,  Issue: 6 )