Titanium oxide films were deposited on bare glass and boiled glass in 50% H2SO4 for 30 min at various substrate temperatures by metal-organic chemical vapor deposition. We investigated the effects of a substrate temperature between 300 and 550 °C on such properties as thermal stability, deposition rate, and chemical states of the films. The thickness of the films is independent of the substrate treatments. The deposition rate of the films is linearly decreased with increasing substrate temperature. Rutherford backscattering spectroscopy and x-ray photoelectron spectroscopy results indicate that the H2SO4 treated glass substrate is superior to the bare glass substrate in the suppression of out-diffusion of sodium and calcium through the TiO2 film till a substrate temperature of 500 °C. There exist only Ti3+ and Ti4+ oxidation states in the film regardless of a substrate temperature and substrate treatment. Ti3+ fractional composition are changed slightly between 0.11 and 0.17 and Ti4+ fractional composition are changed between 0.82 and 0.90 with varying substrate temperature. © 2000 American Vacuum Society.