By Topic

Desorption species from fluorocarbon film by Ar+ ion beam bombardment

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Hayashi, M. ; Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan ; Karahashi, K.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The species that are desorbed from fluorocarbon films by Ar+ ion bombardment were measured. In this study, we constructed a new apparatus in order to investigate desorption species from fluorocarbon films. The measured fluorocarbon films were deposited on a Si wafer by exposing it to a C2F6 plasma in an inductively coupled plasma reactor. The film characteristics were evaluated with x-ray photoelectron spectroscopy (XPS). The C(1s) peak measured in the deposited fluorocarbon films consisted of large chemically shifted peaks produced by C-F3 and C–F2 bonds as well as C–CFx bonds. The species desorbed by Ar+ ion beam bombardment at 1 and 3 keV on the films were detected using a quadrupole mass spectrometer (QMS). The ratios among CF, CF2, CF3, and CF4 species, which were measured with the appearance energies by QMS, indicate that CF4 is a dominant desorption species with the ratio of 80% among them at the beginning of bombardment at 3 keV and 65% at 1 keV. As the ion dose increased, the total amount of desorption species was reduced. XPS measurement indicated that the ion bombardment changed the characteristics of the fluorocarbon films from F-rich to C-rich. This implies that the species desorbed from fluorocarbon films during etching changed gradually.© 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:18 ,  Issue: 4 )