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Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering

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2 Author(s)
Meng, Li-Jian ; Departmento de Fisica, Instituto Superior de Engenharia do Porto, Rua de São Tomé, 4200 Porto, Portugal ; dos Santos, M.P.

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Indium tin oxide (ITO) films were deposited onto glass substrates by radio frequency reactive magnetron sputtering. The distance between the target and the substrate were changed from 50 to 100 mm. X-ray diffraction shows that film prepared at the larger target-substrate distance has a strong orientation along the (440) direction, and as the distance decreases, the intensity of the (440) peak decreases and the intensity of the (222) peak increases. The electrical resistivity of the ITO films decreases as the target-substrate distance gets small. This variation could be related to the change of the orientation of the films, since the film which has a strong (222) peak intensity has a low electrical resistivity. The optical transmittance of the ITO films decreases and the optical band gap moves to the low energy direction, as the target-substrate distance decreases. All of these phenomena will be discussed in this work. © 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:18 ,  Issue: 4 )