Phase development of radio-frequency magnetron sputter-deposited Pb(Mg_1/3Nb_2/3)O₃–PbTiO₃ (90/10) thin films

Pb(Mg_1/3Nb_2/3)O₃–PbTiO₃ (PMN–PT) films were deposited by the radio-frequency magnetron sputtering technique with Pb- and Mg-enriched ceramic targets. The perovskite structural growth was carried out over a wide range of processing parameters. PMN–PT targets were synthesized by the columbite technique. Surface cracking was due to the residual stress induced by low-temperature deposition. To reduce the surface-layer delamination, the substrate temperature during deposition was increased to 500 °C. Even though the amount of the perovskite phase decreased, the surface morphology was free of macrodelaminations and better than the case of room-temperature deposition. By stress releasing, high-temperature deposition reduces the delaminations of the PMN–PT thin films on the Pt/Ti/SiO₂/Si substrate. By controlling the sputtered-particle kinetic energy and the film composition, the surface morphologies were changed to be smooth and delamination-free. © 2000 American Vacuum Society.