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Characterization of plasma deposited Ta2O5 films using grazing incidence x-ray scattering

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Tantalum pentoxide thin films were prepared by plasma enhanced chemical vapor deposition, using a TaF5 source and a microwave excited H2/O2 plasma. The thickness and the density were determined by grazing incidence x-ray scattering, and confirmed by ellipsometry and Rutherford backscattering spectroscopy. Surface roughness measurements by atomic force microscopy and by x-ray scattering differ but suggest the average roughness (rms) is typically 0.28 nm for the amorphous phase and ≪0.83 nm for the crystallized form. © 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:18 ,  Issue: 2 )

Date of Publication:

Mar 2000

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