By Topic

Complex optical microstructure fabricated using inclined immersion lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
T. -Y. Chang ; Institute of Precision Engineering, National Chung Hsing University, Taichung, Taiwan 402 ; H. Yang ; C. -H. Wu ; C. -K. Chao

This research aims at the complex optical microstructures fabrication for optical films to provide a better backlighting module brightness. It utilizes UV lithography technology cooperated with Snell's law. When light pass through an optically transparent material, light deflection depends on the refraction index of the material. By using various transmission medium and changing the substrate inclination, the controllable complex optical microstructures can be fabricated. After being verified by the optical simulation, a 65deg micro-ridge array film can enhance optical brightness more than 50% (from 476 to 716 mcd). It will contribute the backlighting modules industry for liquid crystal display applications.

Published in:

Design, Test, Integration & Packaging of MEMS/MOEMS, 2009. MEMS/MOEMS '09. Symposium on

Date of Conference:

1-3 April 2009