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Direct simulation Monte Carlo (DSMC) of rarefied gas flow during etching of large diameter (300-mm) wafers

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2 Author(s)
Economou, Demetre J. ; Dept. of Chem. Eng., Houston Univ., TX, USA ; Bartel, Timothy J.

Strong density gradients of a gas species can be sustained even at very low pressures when the reaction probability of that species is high. Under these conditions, inlet gas arrangements are very important to reaction uniformity

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Plasma Science, IEEE Transactions on  (Volume:24 ,  Issue: 1 )