By Topic

Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Ehiasarian, A.P. ; Materials and Engineering Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, United Kingdom ; Vetushka, A. ; Hecimovic, A. ; Konstantinidis, S.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3000446 

Plasma composition near the substrate was investigated in a high power impulse magnetron sputtering (HIPIMS) discharge using Langmuir probe analysis, mass spectroscopy, and atomic absorption spectroscopy. The HIPIMS discharge was operated in nonreactive Ar atmosphere at a pressure of 2.66 Pa and the magnetron cathode was furnished with Ti target. Plasma density, metal ion-to-neutral ratio, and gas ion-to-metal ion ratio were studied as a function of discharge current. At peak discharge current densities of ∼1 Acm-2, the results show that a dense plasma (ne∼1018 m-3) expanded from the target toward the substrate and lasted more than 330 μs after the supplied power was turned off. The shape of the time-averaged ion energy distribution function of sputtered material exhibited a transition from Thompson to Maxwellian distribution, indicating efficient energy transfer in the discharge. The metal content in the plasma monotonically increased with discharge current and the metal ion-to-neutral ratio reached approximately 1:1 in the postdischarge plasma at peak current density of 5 Acm-2.

Published in:

Journal of Applied Physics  (Volume:104 ,  Issue: 8 )