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Structural, electrical, and optical properties of InAsxSb1-x epitaxial films grown by liquid-phase epitaxy

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7 Author(s)
Gao, Fubao ; Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People’s Republic of China ; Chen, NuoFu ; Zhang, X.W. ; Wang, Yu
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The InAsxSb1-x films were grown on (100) GaSb substrates by liquid-phase epitaxy, and their structural, electrical, and optical properties were investigated. The high-resolution x-ray diffraction results reveal that the single crystalline InAsxSb1-x films with a midrange composition are epitaxially grown on the GaSb substrates. Temperature dependence of the Hall mobility was theoretically modeled by considering several predominant scattering mechanisms. The results indicate that ionized impurity and dislocation scatterings dominate at low temperatures, while polar optical phonon scattering is important at room temperature (RT). Furthermore, the InAsxSb1-x films with the higher As composition exhibit the better crystalline quality and the higher mobility. The InAs0.35Sb0.65 film exhibits a Hall mobility of 4.62×104 cm2V-1s-1. The cutoff wavelength of photoresponse is extended to about 12 μm with a maximum responsivity of 0.21 V/W at RT, showing great potential for RT long-wavelength infrared detection.

Published in:
Journal of Applied Physics  (Volume:104 ,  Issue: 7 )

Date of Publication: Oct 2008

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