By Topic

Dynamic stencil lithography on full wafer scale

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
6 Author(s)
Savu, V. ; Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland ; van den Boogaart, Marc A.F. ; Brugger, Juergen ; Arcamone, J.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the stencil. In the novel dynamic mode, the stencil is repositioned with respect to the substrate inside the vacuum chamber and its motion is synchronized with the material deposition. This can be done either in a step-and-repeat or in a continuous mode. The authors present the first results proving the accurate x-y-z in situ positioning and movement of our stages during and in between patterning.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:26 ,  Issue: 6 )