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Stable integration of isolated cell membrane patches in a nanomachined aperture

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6 Author(s)
Fertig, N. ; Center for NanoScience and Sektion Physik, Ludwig-Maximilians-Universität, Geschwister-Scholl-Platz 1, 80539 Munich, Germany ; Tilke, A. ; Blick, R.H. ; Kotthaus, J.P.
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We present a method for integrating an isolated cell membrane patch into a semiconductor device. The semiconductor is nanostructured for probing native cell membranes for scanning probe microscopy in situ. Apertures were etched into suspended silicon-nitride layers on a silicon substrate using standard optical lithography as well as electron-beam lithography in combination with reactive ion etching. Apertures of 1 μm diam were routinely fabricated and a reduction in size down to 50 nm was achieved. The stable integration of cell membranes was verified by confocal fluorescence microscopy in situ. © 2000 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:77 ,  Issue: 8 )

Date of Publication:

Aug 2000

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