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Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

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5 Author(s)
Yu, Zhaoning ; Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544 ; Deshpande, Paru ; Wei Wu ; Wang, Jian
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A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He–Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems. © 2000 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:77 ,  Issue: 7 )

Date of Publication:

Aug 2000

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