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Measurement of negative-ion density in high-density C4F8 plasma using a laser photodetachment technique combined with a millimeter-wave open resonator

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2 Author(s)
Kono, A. ; Center for Cooperative Research in Advanced Science and Technology, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan ; Kato, K.

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A technique for measuring negative-ion density in high-density plasmas used for materials processing has been developed; negative ions were detected by measuring the electron-density perturbation caused by laser photodetachment using a millimeter-wave open resonator. The measured negative-ion density for an inductively-coupled C4F8(5%–20%)/Ar plasma with electron densities around 1011cm-3 at a pressure of 25 mTorr was comparable to the electron density. The results suggest that species produced via dissociation of C4F8 attaches electrons as effectively as C4F8. © 2000 American Institute of Physics.

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Applied Physics Letters  (Volume:77 ,  Issue: 4 )