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Using the magneto-optic Kerr effect (MOKE) and magnetic force microscopy we have investigated the shape dependence of magnetization reversal in a series of cobalt and permalloy nanoscale dot arrays. The patterns were produced by e-beam lithography combined with e-beam deposition and lift-off techniques. To avoid pattern to pattern variations in growth-induced anisotropy and or thickness, elliptical elements of varying aspect ratio were deposited simultaneously on a single substrate. All arrays were
Published in:
Applied Physics Letters
(Volume:77
,
Issue:
26
)
Date of Publication: Dec 2000