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Browse Journals & Magazines > Applied Physics Letters ...> Volume:77 Issue:14 Help

Improvement of the thermal stability of NiSi films by using a thin Pt interlayer

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4 Author(s)
Liu, J.F. ; Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China ; Chen, H.B. ; Feng, J.Y. ; Zhu, J.

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The effect of a thin interlayer of Pt on the stability of NiSi films on Si(111) substrates has been investigated. Both x-ray diffraction (XRD) data and sheet resistance measurements show a remarkable improvement in the thermal stability of NiSi due to the Pt interlayer. Detailed study on the XRD data shows PtSi and NiSi form a solid solution following a Vegard’s law. It was found in Ni/Pt/Si samples that a transition in NiSi texture from (200)NiSi∥(111)Si to (002)NiSi∥(111)Si took place before the nucleation of NiSi2, which may contribute to the enhanced stability of NiSi films. © 2000 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:77 ,  Issue: 14 )

Date of Publication: Oct 2000

Page(s):
2177 - 2179
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.1313815
Date of Current Version :
18 June 2009
Issue Date :
Oct 2000

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