Close category search window
 

Oxygen migration during epitaxial regrowth in Cs+-irradiated α-quartz investigated by means of nuclear reaction analysis

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Roccaforte, F. ; II. Physikalisches Institut and SFB 345, Universität Göttingen, D-37073 Göttingen, GermanyIstituto Nazionale per la Fisica della Materia, corso Italia 57, I-95129 Catania, Italy ; Harbsmeier, F. ; Dhar, S. ; Lieb, K.P.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.126757 

The migration of oxygen in ion-beam-amorphized c-SiO2 (α-quartz) was investigated by means of nuclear reaction analysis using the resonant reaction 18O(p,α)15N for oxygen depth profiling. Only very small amounts of oxygen were observed to diffuse in crystalline or in Xe+-ion beam-amorphized α-quartz after high-temperature annealing. However, a dramatic migration of oxygen occurs in Cs+-implanted α-quartz in the same temperature range (600–900 °C), where Cs diffuses out of the amorphized layer and epitaxial recrystallization occurs. These results point out to a strong correlation of all these processes. A mechanism to explain the observed indiffusion of 18O is proposed and is related to the Cs migration and the topological modification to achieve epitaxial regrowth of the SiO2 matrix. © 2000 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:76 ,  Issue: 25 )

Date of Publication: Jun 2000

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.