Cart (Loading....) | Create Account
Close category search window
 

Epitaxial Y2O3 films grown on Si(111) by pulsed-laser ablation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Hunter, M.E. ; North Carolina State University, Department of Materials Science and Engineering, Raleigh, North Carolina 27695 ; Reed, M.J. ; El-Masry, N.A. ; Roberts, J.C.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.126217 

Y2O3 has a relatively high dielectric constant (13–17) leading to several potential applications. In this work, pulsed-laser deposition was used to grow epitaxial Y2O3 films on Si(111) substrates. Structural characterization indicated two-dimensional growth without the formation of an amorphous interfacial layer. Annealing in either Ar or O2 was found to induce an O2 diffusion reaction resulting in the formation of two interfacial amorphous layers. Electrical characterization by capacitance–voltage and current–voltage indicated that the as-grown samples were poor insulating films. Annealing the samples improved the electrical performance by lowering leakage currents and exhibiting inversion during capacitance–voltage testing. This epitaxial growth points toward the possibility of the heteroepitaxial growth of silicon on insulator device structures. © 2000 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:76 ,  Issue: 14 )

Date of Publication:

Apr 2000

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.