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Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient

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4 Author(s)
Schneider, Jochen M. ; Thin Film Physics Division, Department of Physics, Linköping University, SE-58183 Linköping, Sweden ; Anders, Andre ; Hjorvarsson, Bjorgvin ; Hultman, Lars

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The effect of a magnetic field on the plasma composition of a pulsed Au plasma stream in a high-vacuum ambient is described. The plasma was formed with a pulsed vacuum-arc-plasma source, and the time-resolved plasma composition was measured with time-of-flight charge-to-mass spectrometry. Plasma impurities due to ionization of nonmetallic species (H+, O+, and N+) were found to be below the detection limit in the absence of a magnetic field. However, in the presence of a magnetic field (0.4 T), the contribution of ionized nonmetal species to the plasma composition was up to 0.22 atomic ratio. These results are characteristic of plasma-based techniques where magnetic fields are employed in a high-vacuum ambient. In effect, the impurity incorporation during thin-film growth pertains to the present findings. © 2000 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:76 ,  Issue: 12 )