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Erratum: “Structure control and characterization of SrBi2Ta2O9 thin films by a modified annealing method” [Appl. Phys. Lett. 74, 1221 (1999)]

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6 Author(s)
Hu, G. D. ; Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong ; Wilson, I. H. ; Xu, J. B. ; Cheung, W. Y.
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© 1999 American Institute of Physics.

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Applied Physics Letters  (Volume:75 ,  Issue: 14 )