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Erratum: “Suppressed diffusion of boron and carbon in carbon-rich silicon” [Appl. Phys. Lett. 73, 1682 (1998)]

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7 Author(s)
Rücker, H. ; Institute for Semiconductor Physics, Walter-Korsing-Strasse 2, 15230 Frankfurt (Oder), Germany ; Heinemann, B. ; Ropke, W. ; Kurps, R.
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© 1999 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:75 ,  Issue: 1 )