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Microfabrication processes for high-Tc superconducting films

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3 Author(s)
Tsuge, Hisanao ; NEC Corp., Ibaraki, Japan ; Matsui, Shinji ; Takado, N.

Microfabrication processes for Y-Ba-Cu-O films have been investigated using ion-beam techniques. High-Tc superconducting lines as narrow as 0.8 μm have been fabricated from epitaxial YBa2Cu3O7-y films by Ar ion-beam etching (IBE) combined with focused ion-beam (FIB) lithography. The resulting lines, 1.3 μm wide and 2 mm long, showed a zero-resistance temperature of 81 K and a critical current density of 1.9×104 A/cm2 at 77.3 K. Maskless etching was carried out using a 130-keV Au+ FIB with a 0.1-μm-diameter beam. A 50-nm-thick film was patterned into 0.3-μm-wide lines at a dose of 5×1016 ions/cm2 . In comparison with Ar IBE, Cl2 reactive ion-beam etching exhibited an enhancement effect in sputtering yield. Ion implantation with 300-keV Si++ FIB also indicated the possibility of producing submicron patterns by selectively modifying film properties from superconductive to normal or insulating

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Components, Hybrids, and Manufacturing Technology, IEEE Transactions on  (Volume:12 ,  Issue: 4 )